Lithography

Photomasks:

4-, 5- and 6-in. masks with linewidths down to 1.0 micron produced with the Hiedelberg DWL66 laser pattern generator.

Contact Lithography:

For individual dies to whole 6-in. wafers. Our Suss MA6 and AB-M mask aligners also provide back-to-front alignment capabilities. Nanometer resolution e-beam lithography also available.

Maskless Lithography:

Intelligent Micro-Patterning SF-100 provides 5 μm linewidth lithography with direct imaging using a DMD.

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The center is housed within two campus cleanrooms, including a 9,000-sq.-ft., seven-bay, Class 100/1000 facility designed by nationally renowned AGI consultants.
Our wide variety of micro/nanoprocessing tools and 10-plus years of operating experience make our state-of-the-art facilities popular not only with researchers at UofL and other universities throughout the Ohio Valley region, but with industry and government laboratories nationwide, too.