Thin Film Deposition

Evaporation:

Thermal and e-beam assisted evaporation of Cr, Au, ITO and many other materials on up to 6-in. substrates.

Sputtering:

RF & DC magnetron sputtering on up to 4-in. substrates. Cr, Au, Ti, W, TiW, Pt, YBCO, ITO and many others.

Parylene Coating:

Vapor Deposition of Parylene C and Parylene N. Parylene deposition provides the capability to conformally coat dielectric and biocompatible layers on fabricated devices.

Molecular Vapor Deposition:

Deposition of organic surface coatings used as lubricants, antistiction layers, molecular glues or reactive adhesion layers.

Electroplating:

MEMS processing for Cr, Au, Cu and Ni using the IKO electroplating system.

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The center is housed within two campus cleanrooms, including a 9,000-sq.-ft., seven-bay, Class 100/1000 facility designed by nationally renowned AGI consultants.
Our wide variety of micro/nanoprocessing tools and 10-plus years of operating experience make our state-of-the-art facilities popular not only with researchers at UofL and other universities throughout the Ohio Valley region, but with industry and government laboratories nationwide, too.